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| Nama | |||
|---|---|---|---|
|
Nama IUPAC (sistematis)
Trifluoro-λ
3
-chlorane
[
1
]
(substitutive)
|
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|
Nama lain
Chlorotrifluoride
|
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| Penanda | |||
|
Model 3D (
JSmol
)
|
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| 3DMet | {{{3DMet}}} | ||
| ChEBI | |||
| ChemSpider | |||
| Nomor EC | |||
| Referensi Gmelin | 1439 | ||
| MeSH | chlorine+trifluoride | ||
|
PubChem
CID
|
|||
| Nomor RTECS | {{{value}}} | ||
| Nomor UN | 1749 | ||
|
CompTox Dashboard
(
EPA
)
|
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|
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|
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| Sifat | |||
| Cl F 3 | |||
| Massa molar | 92,45 g·mol −1 | ||
| Penampilan | Colorless gas or greenish-yellow liquid | ||
| Bau | sweet, pungent, irritating, suffocating [ 2 ] [ 3 ] | ||
| Densitas | 3.779 g/L [ 4 ] | ||
| Titik lebur | −7.634 °C (−13.709 °F; −7.361 K) [ 4 ] | ||
| Titik didih | 1.175 °C (2.147 °F; 1.448 K) [ 4 ] (decomposes @ 180 °C (356 °F; 453 K)) | ||
| Exothermic hydrolysis [ 5 ] | |||
| Kelarutan | Reacts with benzene, toluene, ether, alcohol, acetic acid, selenium tetrafluoride, nitric acid, sulfuric acid, alkali, hexane. [ 5 ] Soluble in but can be explosive in high concentrations. | ||
| Tekanan uap | 175 kPa | ||
| -26.5·10 −6 cm 3 /mol [ 6 ] | |||
| Viskositas | 91.82 μPa s | ||
| Struktur | |||
| Termokimia [ 7 ] | |||
| Kapasitas kalor ( C ) | 63.9 J K −1 mol −1 | ||
|
Entropi molar standar
(
S
|
281.6 J K −1 mol −1 | ||
|
Entalpi pembentukan standar
(Δ
f
H
|
−163.2 kJ mol −1 | ||
| Energi bebas Gibbs (Δ f G ) | −123.0 kJ mol −1 | ||
| Bahaya | |||
| Bahaya utama | explosive when exposed to organics, reacts violently with water [ 3 ] | ||
| Lembar data keselamatan | natlex.ilo.ch | ||
| Piktogram GHS |
|
||
| Keterangan bahaya GHS | {{{value}}} | ||
| Titik nyala | noncombustible [ 3 ] | ||
| Dosis atau konsentrasi letal ( LD , LC ): | |||
|
LC
50
(
konsentrasi median
)
|
95 ppm (rat, 4 hr)
178 ppm (mouse, 1 hr) 230 ppm (monkey, 1 hr) 299 ppm (rat, 1 hr) [ 8 ] |
||
| Batas imbas kesehatan AS ( NIOSH ): | |||
|
(yang diperbolehkan)
|
C 0.1 ppm (0.4 mg/m 3 ) [ 3 ] | ||
|
(yang direkomendasikan)
|
C 0.1 ppm (0.4 mg/m 3 ) [ 3 ] | ||
|
(langsung berbahaya)
|
20 ppm [ 3 ] | ||
| Senyawa terkait | |||
|
Senyawa terkait
|
Chlorine pentafluoride
|
||
|
Kecuali dinyatakan lain, data di atas berlaku pada
suhu dan tekanan standar
(25 °C [77 °F], 100 kPa).
|
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(
?)
|
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| Referensi | |||
Klorin trifluorida adalah sebuah senyawa interhalogen dengan rumus kimia ClF 3 . Senyawa ini berwujud gas tak berwarna, beracun, korosif , dan sangat reaktif. Senyawa ini sering dijual dalam bentuk cair (dengan diberi tekanan tinggi), dan dalam wujud ini ClF 3 berwarna kuning kehijauan muda. Senyawa ini banyak digunakan sebagai bahan bakar roket , berbagai proses di industri semikonduktor , [ 9 ] [ 10 ] [ 11 ] pengolahan bahan bakar nuklir,, [ 12 ] serta proses-proses industri lainnya. [ 13 ]
Referensi
- ^ "Chlorine trifluoride – Compound Summary" . PubChem Compound . USA: National Center for Biotechnology Information. 16 September 2004. Identification and Related Records . Diakses tanggal 9 October 2011 .
- ^ ClF3/Hydrazine Diarsipkan 2007-02-02 di Wayback Machine . at the Encyclopedia Astronautica.
- ^ a b c d e f "NIOSH Pocket Guide to Chemical Hazards #0117" . National Institute for Occupational Safety and Health (NIOSH).
- ^ a b c Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press . hlm. 4.58. ISBN 978-1-4398-5511-9 .
- ^ a b Chlorine fluoride (ClF3) Diarsipkan 2013-10-29 di Wayback Machine . at Guidechem Chemical Network
- ^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press . hlm. 4.132. ISBN 978-1-4398-5511-9 .
- ^ Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press . hlm. 5.8. ISBN 978-1-4398-5511-9 .
- ^ "Chlorine trifluoride" . Immediately Dangerous to Life and Health . National Institute for Occupational Safety and Health (NIOSH).
- ^ Habuka, Hitoshi; Sukenobu, Takahiro; Koda, Hideyuki; Takeuchi, Takashi; Aihara, Masahiko (2004). "Silicon Etch Rate Using Chlorine Trifluoride" . . 151 (11): G783–G787. doi : 10.1149/1.1806391 .
- ^ Xi, Ming et al. (1997) "Process for chlorine trifluoride chamber cleaning"
-
^
Habuka, Hitoshi (2012).
"Etching of Silicon Carbide Using Chlorine Trifluoride Gas"
.
Physics and Technology of Silicon Carbide Devices
.
doi
:
10.5772/50387
.
ISBN
978-953-51-0917-4
.
-
^
Board on Environmental Studies and Toxicology, (BEST) (2006).
Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5
. Washington D.C.: National Academies Press. hlm. 40.
ISBN
978-0-309-10358-9
.
(available from
National Academies Press
)
- ^ Boyce, C. Bradford and Belter, Randolph K. (1998) "Method for regenerating halogenated Lewis acid catalysts"
